Conventional reactive ion etching (RIE) has generally been used for selective etching of GaAs over...
Whitepaper
The Effects of Increasing the Aspect Ratio of GaAs Backside Vias
To support the current trend in industry of working towards higher via densities which could...
Assessing Deep Reactive Ion Etch (DRIE) at CNF
Cornell University’s Nanoscale Science and Technology Facility (CNF) recently took delivery of a VERSALINE® deep silicon...
Optimization of Low Stress PECVD Silicon Nitride for GaAs Manufacturing
Unaxis solutions for plasma-enhanced chemical vapor deposition (PECVD) silicon nitride (SiNx) are used extensively in...
Silicon Nitride for MEMS Applications: LPCVD and PECVD Process Comparison
The MEMS industry grew by more than 10% in 2012, a year when the semiconductor...
Batch Deposition Module Cuts Downtime and Material Waste
Maximizing yield, increasing throughput and reducing scrap is becoming increasingly critical for SaAs device manufacturers...