Extended process window: PULSE DURATION customization

Extended process window: PULSE POSITION customization



F.A.S.T.® (Fast Atomic Sequential Technology)

At the crossroads of CVD and ALD deposition techniques, F.A.S.T.® proposes: unique film properties, best in class solution for Thick and Conformal layers, and ALD film performances at CVD speed.

Unique Process Control

  • Temporal control      
    - Better film properties
  • Separate species inlets     
    - No parasitic reactions
  • High reaction rate      
    - Lower precursor consumption and higher deposition rate
  • Precise volume introduction   
    - Repeatability


  • Plasma enhanced deposition
  • Unique in-situ cleaning capability
  • Single wafer process module
  • Low cost of ownership


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