Eclipse PVD


Eclipse PVD Systems 

MRC Eclipse Mark IV PVD System

The Mark IV PVD System is now offered by Plasma-Therm as a re-manufactured system. The Mark IV is an upgrade from Mark II, offering a larger process portfolio and occupying a smaller footprint. With one etch chamber and three PVD chambers, the Mark IV is used for depositing metal for interconnects, via fill, silicides, packaging (C4, die attach), and other processes. For applications that do not require a pre-etch chamber, a fourth PVD chamber can be installed. The wafer transport is suitable for gallium arsenide and other compound semiconductor wafers in addition to standard and thinned silicon wafers. Sputtering occurs in vacuum-isolated chambers, limiting contamination. The system features the upgraded Epoch controller with enhanced throughput and factory automation support.

MRC Eclipse Mark II PVD System

The MRC Eclipse Mark II (former OEM Group product) is now supported by Plasma-Therm. Associated with Mark II PVD System are several available upgrades. An advanced controller upgrade allows for more versatile deposition and easier recipe creation. In addition, numerous upgrades are available to replace obsolete components.

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