Marathon™ Stand-Alone IBE Source
Plasma-Therm's Marathon™ IBE stand-alone source is a complete
solution for integration onto existing chambers. The source includes
all necessary source and grid hardware, software, gas distribution
source, grid control rack, and gas and grids required to operate as a stand-alone source,
or to be integrated seamlessly with the host system.
The stand-alone IBE source includes a full control rack with a server-class
computer running Plasma-Therm source control software. The software has an easy-to-use graphical
interface with recipe, data logging, and SECS/GEM
capabilities, and can interface with the host system.
Plasma-Therm’s IBE source is the result of
applying advanced principles of ion beam plasma theory with robust
thermal/mechanical design. The ion source is extremely stable over
the operating range and provides excellent tool-to-tool matching.
The combination of Plasma-Therm Marathon™ source and grids
results in the longest grid life and lowest cost of ownership in the
industry. Through careful design and tolerancing, the grids perform
consistently from beginning to end of life.
Plasma-Therm’s
Marathon™ IBE source meets the needs of stable and repeatable
IBE process with low maintenance, long life etch source and
grids that are proven to provide two to three times
longer life than their
nearest competitors in high-volume manufacturing.
The grid assembly
incorporates innovative features to maintain etch
uniformity over the long life of the grids. These features enable
highly stable grid-to-grid alignment to eliminate
grid plate erosion and contamination. Source life is enhanced by
elimination of source arcing and RF shunting (patent pending).
Plasma-Therm Marathon™ IBE source and grids have a proven
performance and reliability track record in volume production. A
dual PBN option is available for extending the service interval. |
