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Process advantages
- Excellent uniformity
- High Grid-to-Grid repeatability
- High process repeatability wafer to wafer
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IBE Marathon™ Grids
Marathon™ IBE Grids have a proven performance and reliability track record in volume production.
Marathon™ Ion Beam Etch Grids are the result of applying advanced principles of ion beam plasma theory to robust thermal-mechanical design. The grids are extremely stable over the operating range and provide excellent matching between grid sets.
Marathon™ IBE grids have the longest life and lowest cost of ownership in the industry. Through careful design and tolerancing, Marathon™ grids perform consistently from beginning to end of life. Highly stable grid-to-grid alignment minimizes grid plate erosion and contamination, providing stable and repeatable IBE processing. Their proven lifespan is two to three times longer than the nearest competitor in high-volume manufacturing.
Plasma-Therm can retrofit Marathon™ grid assemblies to existing legacy IBE sources. Retrofits includes source stabilization upgrades.
Source upgrades with grid retrofits
- Upgrade source mounting rods for improved mechanical stability.
- Upgrade RF coil position fingers for improved RF plasma repeatability.
- Optional single-piece quartz plasma containment vessel eliminates plasma leaks, thereby enhancing uniformity and eliminating extended troubleshooting downtime.
Grid rebuild service
Level 1: Clean and replace hardware as needed. Complete metrology
report.
Level 2: Clean and anneal plates, clean re-used hardware. Replace consumable hardware. Complete metrology report.
Level 3: New grid plates, clean re-used hardware. Replace consumable hardware.
Complete metrology report.
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Specifications |
Hardware |
Long-life, 3-Grid ion optics. |
Operating range |
Maximum current
determined by grid aperture size selection and beam voltage selection. |
Grid aperture size |
12 in. |
Lifespan |
More than 2 times longer than competing
grids. |
Compatibility |
150 mm wafer, 200 mm wafer and
up to 9.5-inch pallet. |
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